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Offered for positive photoresist formulations.High-purity low-trace metal solvent and is tested to measure selected critical trace metals. Used in coatings ,semiconductors ,sensitive electronic applications. Viscosity reducer for resins used in photoresist formulations.Used in coatings ,semiconductors ,sensitive electronic applications High boiling, slow evaporating glycol ether providing low trace metals content for sensitive electronic applications.Being presented for photoresist applications/formulations, specifically for photoresist removers/strippers. Extremely low metal content and is an excellent choice for use in etching solutions for semiconductor chips and other electronic applications. Slow evaporating solvent with both ether and ester functional groups. Colorless liquid with a mild odor. Utilized in a variety of specialty cleaning operations and is used mainly in coatings. High-purity solvent with greater protection against organic peroxide formation. Manufactured for semiconductor and electronics applications. Offered for negative photoresist formulations.Necessary in the process for spin-coating photosensitive (photoresist) materials evenly onto a silicon wafer.Used in coatings ,semiconductors ,sensitive electronic applications .
Eastman EastaPure™
Coating ingredients supplied by Eastman
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Eastman EastaPure™ MPK
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