SIPOMER® WAM II by Syensqo is an APE-free, methacrylic monomer. Its composition is based on 46-50% methacrylamidoethyl ethylene urea (MAEEU). It provides enhanced wet adhesion, wet-scrub resistance and solvent resistance in a wide range of latex systems. SIPOMER® WAM II exhibits improved chemical- and water resistance to the polymer systems. It promotes adhesion of polymer resins to metal, glass, concrete and other inorganic substrates in many applications including industrial, maintenance, automotive and architectural. It improves polymer stability and durability. It is suitable for latex applications.
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SIPOMER® WAM II properties
Other properties
| Properties | Value & unit | Test condition | Test method |
|---|---|---|---|
| Boiling Point | 0.0 Visible After Login | Visible After Login | Visible After Login |
| Density | 0.0 Visible After Login | Visible After Login | Visible After Login |
| Flash Point, Closed Cup | 0.0 Visible After Login | Visible After Login | Visible After Login |
| Freezing Point | 0.0 Visible After Login | Visible After Login | Visible After Login |
| Glass Transition Temperature (Tg) | 0.0 Visible After Login | Visible After Login | Visible After Login |
| Hydroquinone Content | 0.0 Visible After Login | Visible After Login | Visible After Login |
| Methacrylic Acid Content | 0.0 Visible After Login | Visible After Login | Visible After Login |
| Molecular Weight, Mw | 0.0 Visible After Login | Visible After Login | Visible After Login |
| Vapor Pressure | 0.0 Visible After Login | Visible After Login | Visible After Login |
| Viscosity | 0.0 Visible After Login | Visible After Login | Visible After Login |
| Volatile Content | 0.0 Visible After Login | Visible After Login | Visible After Login |
| Water Content | 0.0 Visible After Login | Visible After Login | Visible After Login |
| pH | 0.0 Visible After Login | Visible After Login | Visible After Login |