BMP by Wuhan Bolachem New Material is butyne glycol ether. It is suitable for the synthesis and preparation of acetylenic alcohol-modified polysiloxane surfactant, which can be used as super wetting-, defoaming agent and foam suppressor.
- It possesses high purity and is easy for industrial reactions.
- It is designed for adhesive applications.
- BMP provides low foaming, substrate wetting, anti-crater and leveling properties.
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